In article number 2100653, Thien N. Truong, Josua Stuckelberger, Hieu T. Nguyen, and co-workers explored the possibility of p-type co-doping poly-Si/SiOx passivating contacts using the spin-on method with different mixtures of Ga and B glass solutions. READ FULL...

Herein, we fabricate and characterize p-type passivating contacts based on industrial intrinsic polycrystalline silicon (poly-Si)/thermal-SiOx/n-type crystalline Si (c-Si) substrates using a spin-on doping technique. The impacts of drive-in temperature, drive-in dwell...

Polycrystalline silicon (poly-Si) passivating contacts are promising technologies to promote the efficiency of silicon solar cells, due to their low carrier recombination and low contact resistivity. In this work, we present phosphorus spin-on doping as an alternative...

In this study, we explore the utilization of inkjet printing technology with liquid ink to fabricate boron-doped polycrystalline silicon (poly-Si)/SiOx passivating contacts. The impacts of substrate morphology, baseplate temperature, and surface oxide on the printing...

Herein, high-quality localized phosphorus-doped polycrystalline silicon (poly-Si) passivating contacts containing nanoscale poly-Si film (∼100 nm) on an ultrathin SiOx layer (∼1.5 nm) were fabricated via an inkjet printing technique. Read Full Article